• After removal with Al2O3 the diffusing LiSi-layer allows secure adhesive bond of monlothic ZrO2
• Reliable adhesive bond decreasing the risk of chipping
• Allowing long time stable and durable adhesive bond
• Minimal invasive ZrO2 restaurations like veneers are now doable
• Stain and Glaze foundation for any Type of HF-Stains
*To avoid misuse please study IFU carefully!